基于傅里叶红外光谱分光的椭偏薄膜测量技术  

Thin-film ellipsometry measurement based on Fourier infrared spectroscopy

作　　者：吴传超 苏宏锦[2] 张治祥 张佳莹 薛鹏 张瑞[1,2] WU Chuanchao;SU Hongjin;ZHANG Zhixiang;ZHANG Jiaying;XUE Peng;ZHANG Rui(School of Information and Communication Engineering,North University of China,Taiyuan030051,China;Technology Innovation Center of Shanxi Provincial for Intelligent Microwave Photoelectric,North University of China,Taiyuan030051,China)

机构地区：[1]中北大学信息与通信工程学院,山西太原030051 [2]中北大学山西省智能微波光电技术创新中心,山西太原030051

出　　处：《光学技术》2025年第2期252-256,共5页Optical Technique

基　　金：山西省基础研究计划(20210302123208)。

摘　　要：随着半导体集成电路、平板显示、光伏太阳能等技术的发展,在红外波段具有优良光学特性的薄膜材料被广泛应用,而薄膜厚度的高精度测量将直接对器件的加工质量产生影响。光谱椭偏技术是一种非接触式、高精度的薄膜测量技术,是其检测的最好手段。但现有光谱椭偏仪主要集中在可见-近红外波段,无法满足中红外光学薄膜的测量要求。为此,提出一种采用傅里叶光谱分光模式和多方位补偿器相结合的红外光谱椭偏薄膜测量技术。结合椭偏测量理论,通过搭建傅里叶红外光谱椭偏仪实现2100~3200nm波段范围内不同厚度Si基SiO_(2)标准薄膜样品的测量。结果显示,薄膜厚度测量精度优于±0.5nm,重复性测量精度优于0.07nm,全谱段单次单点测量时间约1min。With the development of the semiconductor integrated circuit,flat panel display,and photovoltaic solar energy etc.Thin film materials with excellent optical properties in infrared band are widely used in many fields.If the film thickness of these infrared thin-film can be measured with high precision and speed,it is of great significance for improving performance of products.As a best means of film detection,the technology of spectral ellipsometry is with the features of non-contact,non-destructive,high-precision,and multi-parameter measurement.However,the existing spectroscopic ellipsometry cannot meet the requirements for the measurement of optical films in the infrared band.For this purpose,a technology of thin-film ellipsometry measurement based on Fourier infrared spectroscopy is proposed.According to the technical principle,an infrared ellipsometer with wavelength range of 2100~3200nm is established.The feasibility and accuracy of the ellipsometer are verified by testing standard SiO_(2)-Si sample with different thicknesses.The results show that the measurement accuracy of thin-film thickness is±0.5nm in the range of 2100~3200nm,the thickness repeatability measurement accuracy is 0.07nm,and the single point measurement time is approximately 1min.

关 键 词：光谱椭偏 薄膜测量 傅里叶红外光谱分光 

分 类 号：TB383.2[一般工业技术—材料科学与工程] O657.33[理学—分析化学]