磁悬浮熔炼铸坯的严重塑性变形制造高纯超细晶Al-0.5Cu溅射靶材  

High Purity Ultra-fine Grain Al-0.5Cu Sputtering Target Produced by Severe Plastic Deformation of Magnetic Suspension Melting

作　　者：林镇宇 林耀军 LIN Zhenyu;LIN Yaojun(School of Materials Science and Engineering,Wuhan University of Technology,Wuhan 430070)

机构地区：[1]武汉理工大学材料科学与工程学院,武汉430070

出　　处：《特种铸造及有色合金》2025年第3期447-455,共9页Special Casting & Nonferrous Alloys

摘　　要：以高纯Al、Cu为原料,采用水冷铜坩埚中真空磁悬浮感应熔炼获得Al-0.5Cu铸坯。元素分析结果表明,铸坯保持了Al-0.5Cu的合格成分;与原料中O、N浓度相比,铸锭中O(33 mg/kg)、N(30 mg/kg)浓度几乎不变;其他杂质元素的总浓度从原料中的25.66 mg/kg降至17.20 mg/kg。随后将铸坯通过大塑性变形多向压缩和热处理制备高纯超细晶Al-0.5Cu溅射靶材。试验结果显示,当多向压缩6周期时,合金硬度(HV)达到最大值89,晶粒尺寸为268 nm;然后硬度随多向压缩周期增加而降低,这一现象是压缩过程中动态回复的结果。对多向压缩6周期合金进行150℃×1 h退火时,试样获得超细晶(632 nm)且有较高的屈服强度(154.7 MPa);225℃×1 h退火时,材料已完全再结晶,晶粒尺寸为8.5μm,屈服强度下降至81.9 MPa。对6周期多向压缩材料继续冷轧制备薄片溅射靶材,经150℃×1 h退火后,晶粒尺寸为930 nm。由晶粒尺寸为930 nm的高纯超细晶Al-0.5Cu靶材溅射沉积的薄膜光滑致密无裂纹,厚度均匀,表面粗糙度Ra为5.05 nm,具有良好的薄膜质量。Magnetically levitated vacuum induction melting of Al-0.5Cu casting billet in water-cooled copper crucible was carried out with high purity Al and Cu as raw materials.The elemental analysis results indicate that the casting billet exhibits acceptable compositions of constituent elements Al and Cu.Compared with the concentrations of impurity O and N in the raw material,the concentrations of O(33 mg/kg)and N(30 mg/kg)in the casting remain almost unchanged.The total concentration of other impurity elements is decreased from 25.66 mg/kg in the raw material to 17.20 mg/kg in the casting.Subsequently,the high-purity ultra-fine grain Al-0.5Cu sputtering target was prepared by severe plastic deformation multi-directional compression and heat treatment.The experimental results reveal that the hardness of the sample reaches a maximum of 89 HV and the grain size is 268 nm when the sample is subjected to 6-cycles multi-directional compression.Then the hardness is decreased with the increase of multi-directional compression cycle,which is attributed to dynamic recovery during compression process.When the 6-cycle multi-directional compression alloy is annealed at 150℃for 1 h,ultra-fine grain(632 nm)can be obtained and a high yield strength(154.7 MPa)is achieved.The alloy has been completely recrystallized at 225℃for 1 h with average grain size of 8.5μm and yield strength reduced to 81.9 MPa.The thin sputtering target subjected to 6-cycles multi-directional compression was cold rolled,and the grain size is 930 nm after annealed at 150℃for 1 h.The film deposited by high purity ultra-fine grain Al-0.5Cu sputtering targe with the grain size of 930 nm exhibits a smooth and dense surface with absence of cracks,and the surface roughness is 5.05 nm with well film quality.

关 键 词：高纯溅射靶材 真空磁悬浮感应熔炼 严重塑性变形 AL-CU合金 

分 类 号：TG146.21[一般工业技术—材料科学与工程]