Preparing sub-monolayer metals with continuous coverage spread for high-throughput growth of metal-organic frameworks  

作　　者：Jiayi Lu Yizhang Li Hao Jiang Zhiwen Zhu Fengru Zheng Qiang Sun 

机构地区：[1]Materials Genome Institute,Shanghai Engineering Research Center for Integrated Circuits and Advanced Display Materials,Shanghai University,Shanghai 200444,China

出　　处：《Chinese Chemical Letters》2025年第3期454-457,共4页中国化学快报(英文版)

基　　金：supported by National Natural Science Foundation of China(Nos.22072086,22302120).

摘　　要：Surface-confined metal-organic frameworks have emerged as versatile structures with a broad spectrum of applications such as nanoelectronics,catalysis,sensing,and molecular storage,owing to their unique structural and electronic properties.However,the exploration and optimization of molecular networks typically involve resource-intensive trial-and-error experiments.The complexity comes from factors like metal nodes,organic ligands,substrates,and the preparation conditions.To address this challenge,highthroughput methodologies have been used in materials exploration.In this work,we explored a highthroughput method for preparing sub-monolayer metals with continuous coverage spread on metal surfaces.By employing a physical mask during metal deposition under ultra-high vacuum conditions,we achieved sample libraries with copper(Cu)and silver(Ag)adatoms on the metal substrates,and constructed surface-supported metal-organic frameworks with varying metal-to-molecule stoichiometric ratios.This approach facilitates the exploration of surface-confined metal-organic frameworks,particularly in terms of varying metal-to-ligand stoichiometric ratios,offering an efficient pathway to unlock the potential of these intricate two-dimensional networks.

关 键 词：Surface-confined metal-organic frameworks High-throughput preparation Scanning tunneling microscopy(STM) Surface science Stoichiometric design 

分 类 号：O641[理学—物理化学] O64[理学—化学]