薄壳元件的磁控磁流变弹性体均匀抛光  

Magnetorheological elastomer uniform polishing method for shell components

作　　者：薛勃 朱力军 苏星 陈立 周涛 张建飞 海阔 黄文 XUE Bo;ZHU Lijun;SU Xing;CHEN Li;ZHOU Tao;ZHANG Jianfei;HAI Kuo;HUANG Wen(College of Mechanical and Electrical Engineering,Northeast Forestry University,Harbin 150040,China;Sichuan Precision and Ultra-Precision Machining Engineering Technology Center,Chengdu 610200,China)

机构地区：[1]东北林业大学机电工程学院,黑龙江哈尔滨150040 [2]四川省精密超精密加工工程技术研究中心,四川成都610200

出　　处：《光学精密工程》2025年第3期402-415,共14页Optics and Precision Engineering

基　　金：“某装备光束系统关键器件超精密加工制造生产线”项目(No.J0017-2326-QT);国家重点研发计划资助项目(2022YFB3403402);国家自然科学基金资助项目(No.52105488)。

摘　　要：为实现薄壳元件内表面的高质量超精密抛光,基于磁控磁流变弹性体(Magnetorheological Elastomer, MRE)抛光原理提出了一种均匀抛光方法。该方法通过在薄壳元件外表面施加磁场,精确控制MRE对内表面的压力,从而实现内表面均匀抛光。利用COMSOL Multiphysics软件对MRE进行磁-弹性耦合数值模拟,确定元件表面的抛光压力及其分布,获得抛光区域的速度分布,并基于Preston方程构建抛光去除函数模型。随后对该模型进行离散化采样,推导材料去除量向量,并采用非负最小二乘法计算抛光区域各点的驻留时间。最后,在磁场强度为0.32 T的条件下,使用磁控MRE抛光装置对尺寸为60 mm×60 mm×1 mm的熔石英玻璃工件进行了78 min的抛光实验。实验结果表明,通过控制抛光区域各驻留点的时间,磁控区域的表面材料平均去除深度为84.4 nm,去除深度波动范围为10.9%,实现了表面均匀抛光。由此证明了该方法实现薄壳元件内表面均匀抛光的有效性。This study introduces a novel uniform polishing method for the ultra-precision finishing of the in⁃ner surfaces of thin-shell components,based on the principles of magnetorheological elastomer(MRE)polishing.The methodology involves the application of a magnetic field to the outer surface of the compo⁃nent,enabling precise control of the MRE pressure on the inner surface,thereby facilitating uniform pol⁃ishing.Magneto-elastic coupling simulations of the MRE were conducted using COMSOL Multiphysics software to determine the polishing pressure,its distribution across the component surface,and the veloci⁃ty distribution within the polishing area.A material removal function model was developed based on the Preston equation,which was subsequently discretized and sampled to derive the material removal vector.The residence time at each point in the polishing area was calculated using the non-negative least squares method.To validate the proposed approach,a polishing experiment was conducted under a magnetic field of 0.32 T,utilizing a magnetorheological MRE device to polish a fused quartz glass workpiece measuring 60 mm×60 mm×1 mm for a duration of 78 minutes.The experimental results indicated that control⁃ling the residence time at each point achieved an average material removal depth of 84.4 nm,with a fluctu⁃ation range of 10.9%,thereby attaining a uniform surface finish.These findings substantiate the effective⁃ness of the proposed method in achieving uniform polishing of the inner surfaces of thin-shell components.

关 键 词：超精密加工 均匀抛光 薄壳元件 磁流变弹性体 去除深度 磁场 

分 类 号：TG664[金属学及工艺—金属切削加工及机床] TB381[一般工业技术—材料科学与工程]