Facet-selective etching by pyridazine toward robust ruthenium-based oxygen evolution catalysts  

在线阅读下载全文

作  者:Xueting Cao Yikun Kang Tao Jiang Zhe Chen Yaming Hao Shuangshuang Cha Wei Du Yefei Li Ming Gong 

机构地区:[1]Department of Chemistry,Shanghai Key Laboratory of Molecular Catalysis and Innovative Materials and Collaborative Innovation Center of Chemistry for Energy Materials(iChEM),Fudan University,Shanghai 200438,China

出  处:《Nano Research》2025年第4期601-609,共9页纳米研究(英文版)

基  金:supported by the National Natural Science Foundation of China(No.22172036);the Fundamental Research Funds for the Central Universities(No.20720220011).

摘  要:Stable oxygen evolution reaction(OER)catalyst alternatives to the precious IrO_(2) catalysts are of great importance to the next-generation proton-exchange membrane(PEM)electrolyzers.RuO_(2)-based materials are promising candidates but suffer from low stability under highly anodic potentials.Here,we reported a facet-selective etching strategy to improve the stability of polycrystalline RuO_(2) without significantly affecting the activity.The selective etching was enabled by the specific chemisorption of pyridazine(pyd)with contingent N atoms onto the RuO_(2) surface.The pyd-RuO_(2) catalyst,after etching,exhibited a low overpotential 247 mV at 100 mA·cm^(-2) and obvious stability improvement of over 200 h at 100 mA·cm^(-2) with only 0.63% Ru loss in acidic conditions.Combining various characterization techniques and theoretical calculations,we revealed that the crystalline RuO_(2)(110)facet is favorably etched by the coordination of pyridazine while protecting other surfaces,which significantly enriches the RuO_(2)(110)facets toward higher OER stability via the dynamic dissolution and repair mechanism in the ordered manner.This study offers alternative perspectives on the dissolution and stability mechanism of RuO_(2) and the facet-selective modulation of nanocrystals by ligand-driven etching.

关 键 词:ruthenium dioxide oxygen evolution reaction stability PYRIDAZINE facet-selective etching 

分 类 号:O643.36[理学—物理化学]

 

参考文献:

正在载入数据...

 

二级参考文献:

正在载入数据...

 

耦合文献:

正在载入数据...

 

引证文献:

正在载入数据...

 

二级引证文献:

正在载入数据...

 

同被引文献:

正在载入数据...

 

相关期刊文献:

正在载入数据...

相关的主题
相关的作者对象
相关的机构对象