X射线光电子能谱测试参数对CaF_(2)氧元素含量测试结果的影响  

The influence of X-ray photoelectron spectroscopy test parameters on the test results of CaF_(2)oxygen content

作　　者：侯瑶 崔云[2] 陶春先[1] 冯殿福 HOU Yao;CUI Yun;TAO Chunxian;FENG Dianfu(School of Optical-Electrical and Computer Engineering,University of Shanghai for Science and Technology,Shanghai 200093,China;Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China)

机构地区：[1]上海理工大学光电信息与计算机工程学院,上海200093 [2]中国科学院上海光学精密机械研究所,上海201800

出　　处：《理化检验(物理分册)》2025年第3期25-31,共7页Physical Testing and Chemical Analysis(Part A:Physical Testing)

基　　金：上海理工大学专业学位研究生实践基地项目(23-24-302-001);中国科学院功能晶体与激光技术重点实验室开放课题(FCLT202303)。

摘　　要：针对在X射线光电子能谱刻蚀剖析过程中出现测试结果失真的问题,以CaF2试样为研究对象,通过改变离子束能量、刻蚀后停顿时间、氧元素的精细谱扫描顺序等参数,对试样表面氧元素含量的测试结果进行分析,同时使用SRIM软件模拟计算氩离子束刻蚀CaF2产生的空位缺陷,为测试失真分析提供数据支持。结果表明:在CaF2表面测得氧元素的原因为试样表面吸附残余气体中的羟基和O2;通过优化X射线光电子能谱测试参数,有效去除了表面的羟基和吸附的O2,削弱或者消除了残余气体对测试结果的影响;材料的极性分子和低表面结合能是离子刻蚀过程中表面快速吸附残余气体的主要原因。研究结果对使用X射线光电子能谱准确表征具有极性分子材料的元素成分具有重要指导意义。Aiming at the problem of distortion of test results in the process of X-ray photoelectron spectroscopy etching analysis,the CaF2 sample was taken as the research object.The test results of oxygen content on the surface of the sample were analyzed by changing the parameters such as ion beam energy,pause time after etching,and fine spectrum scanning sequence of oxygen elements.At the same time,SRIM software was used to simulate the vacancy defects generated by argon ion beam etching of CaF2,which provided data support for test distortion analysis.The results show that the oxygen element measured on the surface of CaF2 was due to the adsorption of hydroxyl and O2 in the residual gas on the surface of the sample.By optimizing the X-ray photoelectron spectroscopy test parameters,the surface hydroxyl and adsorbed O2 could be effectively removed,and the influence of residual gas on the test results could be weakened or eliminated.The polar molecules and low surface binding energy of the material were the main reasons for the rapid adsorption of residual gas on the surface during ion etching.The research results had important guiding significance for the accurate characterization of the elemental composition of polar molecular materials by X-ray photoelectron spectroscopy.

关 键 词：X射线光电子能谱 刻蚀深度剖析 表面吸附 表面分析技术 SRIM软件 

分 类 号：TH838[机械工程—仪器科学与技术]