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作 者:Jacopo Ruggeri Udo Ausserlechner Helmut Köck Karen M.Dowling
机构地区:[1]Department of Microelectronics,Delft University of Technology,2628 CD Delft,The Netherlands [2]Infineon Technologies AG,9500 Villach,Austria
出 处:《Microsystems & Nanoengineering》2025年第1期321-333,共13页微系统与纳米工程(英文)
摘 要:Microelectronic magnetic sensors are essential in diverse applications,including automotive,industrial,and consumer electronics.Hall-effect devices hold the largest share of the magnetic sensor market,and they are particularly valued for their reliability,low cost and CMOS compatibility.This paper introduces a novel 3-axis Hall-effect sensor element based on an inverted pyramid structure,realized by leveraging MEMS micromachining and CMOS processing.The devices are manufactured by etching the pyramid openings with TMAH and implanting the sloped walls with n-dopants to define the active area.Through the use of various bias-sense detection modes,the device is able to detect both in-plane and out-of-plane magnetic fields within a single compact structure.In addition,the offset can be significantly reduced by one to three orders of magnitude by employing the current-spinning method.The device presented in this work demonstrated high in-plane and out-of-plane current-and voltage-related sensitivities ranging between 64.1 to 198 V A−1 T−1 and 14.8 to 21.4 mV V^(−1) T−1,with crosstalk below 4.7%.The sensor exhibits a thermal noise floor which corresponds to approximately 0:5μT/√Hz p at 1.31 V supply.This novel Hall-effect sensor represents a promising and simpler alternative to existing state-of-the-art 3-axis magnetic sensors,offering a viable solution for precise and reliable magnetic field sensing in various applications such as position feedback and power monitoring.
关 键 词:inverted pyramid axis Hall effect mems micromachining inverted pyramid structurerealized etching pyramid openings magnetic sensor microelectronic magnetic sensors cmos processingthe
分 类 号:TP212[自动化与计算机技术—检测技术与自动化装置]
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