Synthesis and characterization of high-purity SiO_(2)nanoparticles utilizing greater club rush:Exploring a promising natural source  

作　　者：Anuchit Sawangprom Tachgiss Jampreecha Santi Maensiri 

机构地区：[1]School of Physics,Institute of Science,Suranaree University of Technology,Nakhon Ratchasima 30000,Thailand [2]Suranaree University of Technology Center of Excellence on Advanced Functional Materials(SUT-AFM,Suranaree University of Technology,Nakhon Ratchasima 30000,Thailand [3]Faculty of Mathematics and Natural Sciences,University of Malang,Malang 65145,Indonesia

出　　处：《International Journal of Minerals,Metallurgy and Materials》2025年第5期1234-1244,共11页矿物冶金与材料学报(英文版)

基　　金：supported by the Suranaree University of Technology(SUT)Center of Excellence(CoE)on Advanced Functional Materials(AFM),School of Physics,Suranaree University of Technology,Nakhon Ratchasima,Thailand,the External Grants and Scholarships for Graduate Students,Suranaree University of Technology,Nakhon Ratchasima,Thailand,and the Research Network on Nanotechnology(RNN),Suranaree University of Technology,Nakhon Ratchasima,Thailand.

摘　　要：High-purity SiO_(2)nanoparticles(SNPs)play a crucial role in various electronic applications,such as semiconductors,solar cells,optical fibers,lenses,and insulating layers,given their purity and particle size,which significantly impact device efficiency.This study fo-cuses on the synthesis and characterization of pure SNPs through the chemical etching of greater club rush.White powder SNPs were pre-pared using HCl etching,and their thermal behaviors were analyzed via thermogravimetric analysis/differential scanning calorimetry.Structural properties were investigated using X-ray fluorescence,scanning electron microscopy,and transmission electron microscopy.X-ray absorption near-edge structure was employed to assess the oxidation state of the SNPs.The morphology of the SNPs after the first etching was amorphous,with sizes ranging from 50 to 100 nm,which increased to 50-200 nm after the second etching.Despite this size variation,the SNPs maintained a high purity level of 99.8wt%SiO_(2),comparable with industry standards.Notably,the second etching with 0.1-M HCl significantly enhanced the purity level,achieving 99.8wt%SiO_(2)mass.Furthermore,HCl etching facilitated the formation of SiO_(2)in the Si^(4+)oxidation state,akin to industrial SNPs.These findings underscore the critical role of HCl etching in synthesizing high-purity SNPs,with potential applications in advanced electronic devices.

关 键 词：SILICA NANOPARTICLES synthesis characterization greater club rush 

分 类 号：O613.71[理学—无机化学]