Particle-in-cell simulations of electron beam-plasma discharge in a narrow gap with varying transverse boundary conditions  

作　　者：Jiahong CHEN Jian CHEN Qinchuang CAO Zhibin WANG 陈嘉宏;陈坚;曹勤创;王志斌

机构地区：[1]Sino-French Institute of Nuclear Engineering and Technology,Sun Yat-sen University,Zhuhai 519082,People’s Republic of China

出　　处：《Plasma Science and Technology》2025年第4期50-57,共8页等离子体科学和技术(英文版)

基　　金：supported by National Natural Science Foundation of China(Nos.12175322 and 12305223);the National Natural Science Foundation of Guangdong Province(No.2023A1515010762)。

摘　　要：In this work,the effects of transverse boundary conditions,specifically the bias voltage on the transverse wall and the gap width,on the electron beam-generated plasmas(EBPs)confined in a narrow gap,are investigated using the particle-in-cell/Monte Carlo collision(PIC/MCC)simulations.Simulation results reveal that the application of bias voltage causes beam deflections,leading to the formation of band structures in the beam electron velocity space.Three branches of electrostatic waves,including electron beam mode,Langmuir wave,and electron acoustic mode,are identified.Increasing the bias voltage and reducing gap width intensify beam deflections,resulting in the suppression of waves.Both wave excitation and beam deflection significantly modify beam electron transport,leading to the plasma non-uniformity.These findings enhance the understanding of beam transport and plasma behavior in discharges confined in a narrow gap.

关 键 词：electron beam-generated plasmas gap width bias voltage beam deflection wave excitation 

分 类 号：O53[理学—等离子体物理]