多束电子源设计与实验  

Design and experiment of multi-beam electron source

作　　者：赵伟霞[1,2] 白凌超 张利新 刘俊标 殷伯华[1,2] 韩立 ZHAO Weixia;BAI Lingchao;ZHANG Lixin;LIU Junbiao;YIN Bohua;HAN Li(Research Department of Micro-nano Fabrication Technology and Intelligent Electronic Devices,Institute of Electrical Engineering,Chinese Academy of Sciences,Beijing 100190,China;School of Electronic,Electrical and Communication Engineering,University of Chinese Academy of Sciences,Beijing 100049,China;School of Instrument Science and Optoelectronics Engineering,Beijing Information Science and Technology University,Beijing 100192,China)

机构地区：[1]中国科学院电工研究所微纳加工技术与智能电气设备研究部,北京100190 [2]中国科学院大学电子电气与通信工程学院,北京100049 [3]北京信息科技大学仪器科学与光电工程学院,北京100192

出　　处：《光学精密工程》2025年第5期741-750,共10页Optics and Precision Engineering

基　　金：中国科学院科研仪器设备研制项目(No.PTYQ2024BJ0004)。

摘　　要：为了提高扫描电子显微镜等单电子束设备的通量,开发了基于肖特基阴极的多束电子源系统,研究了准直透镜、分束板及微阵列静电透镜的设计方法与制备工艺。根据肖特基阴极发射特性进行了静电准直透镜的设计,仿真计算了准直束的电子光学性能。基于MEMS加工工艺实现了3×3和10×10多孔阵列分束板的制备,开发了多孔多层器件装配系统并实现了微阵列静电透镜的高精度装配;搭建了多束电子源测试平台并进行了多束电子源的准直、分束与聚焦性能验证。结果表明:多束电子源的准直束范围为600μm,准直范围内的束流密度为4.11 A/m^(2)、均匀度为6.06%;实现了3×3分束且大小可调,聚焦后的子束束斑直径均值为5.32μm,束斑直径均匀度为5.91%,束流强度均匀度为4.36%,间距均匀度为3.06%,满足多电子束设备的设计要求。To enhance the throughput of single-beam devices,such as scanning electron microscopes,a multi-beam electron source system utilizing a Schottky gun was developed.This study encompasses the design methodologies and fabrication processes for the collimator lens,aperture array,and micro-arrayed electrostatic lenses.The electrostatic collimator lens was designed based on the emission characteristics of the Schottky cathode,and the performance of the collimated beam was subsequently calculated.Aperture arrays,including configurations of 3×3 and 10×10 for beam splitting,were fabricated utilizing MEMS technology,and a high-precision assembly system was established to enable the assembly of micro-arrayed electrostatic lenses.Experiments concerning beam collimation,splitting,and focusing were conducted on a dedicated multi-beam electron source experimental platform,validating the performance of the 3×3 mul⁃tibeam electron source.Experimental results indicate that the collimated spot size was measured to be 600μm with a beam current density of 4.11 A/m^(2)and a uniformity of 6.06%.The average diameter of the fo⁃cused beamlet is recorded at 5.32μm,accompanied by size uniformity of 5.91%,intensity uniformity of 4.36%,and pitch uniformity of 3.06%,all of which meet the design criteria of the multi-beam setup.

关 键 词：电子光学 多束电子源 肖特基发射 准直透镜 微阵列单电位透镜 

分 类 号：TN16[电子电信—物理电子学]