工业纯钛TA2的电解抛光/腐蚀工艺  

Electrolytic Polishing/Corrosion Process of Industrial Pure Titanium TA2

作　　者：朱晓俊 徐伏根 徐伏根 冯骥 张力 王岱庆 陆旭映 陈炎 吴昊 唐裕骞 ZHU Xiaojun;XU Fugen;XU Fugen;FENG Ji;ZHANG Li;WANG Daiqing;LU Xuying;CHEN Yan;WU Hao;TANG Yuqian(Hangzhou Steam Turbine Power Group Co.,Ltd.,Hangzhou 311103,China)

机构地区：[1]杭州汽轮动力集团股份有限公司,杭州311103

出　　处：《腐蚀与防护》2025年第4期96-99,107,共5页Corrosion & Protection

摘　　要：对工业纯钛TA2的电解抛光/腐蚀的电解液配方和工艺参数进行了研究与优化,得到的最佳电解液配方是90 mLHF,20 g(NH_(4))_(2)S_(2)O_(8),200 mL CH_(3)CH_(2)OH,360 mL H2O,与之匹配的工艺参数是抛光电压50 V,电解液流量20 mL/s,抛光时间50 s,电解抛光/腐蚀后得到的试样表面平整,组织清晰,无污染,且制样时间短,较机械抛光/腐蚀有很大的进步,采用该配方,调整相应工艺参数便可电解抛光其他钛合金材料。The electrolyte formula and process parameters for electrolytic polishing/corrosion of industrial pure titanium TA2 were studied and optimized.The optimal electrolyte formula was obtained as 90 mL HF,20 g(NH_(4))_(2)S_(2)O_(8),200 mL LCH_(3)CH_(2)OH,360 mL H2O.The matching process parameters were polishing voltage of 50V,electrolyte flow rate of 20 mL/s,polishing time of 50 s.The surface of the sample obtained after electrolytic polishing/corrosion was smooth,the metallographic structure was clear,and there was no pollution.The sample preparation time was short,which was a great improvement compared to mechanical polishing/corrosion.By using this formula and adjusting the corresponding process parameters,other titanium alloy materials could be electrolytically polished.

关 键 词：工业纯钛 电解抛光/腐蚀 配方 电解参数 显微组织 

分 类 号：TG174.4[金属学及工艺—金属表面处理]