场发射显示器件中真空获得和维持工艺的改进  

Improvement in Vacuum Pumping and Maintaining of Field Emission Display Device

作　　者：张军 袁璟[1] 杜秉初[1] 李德杰[1] 

机构地区：[1]清华大学电子工程系,北京100084

出　　处：《真空科学与技术》2002年第6期447-449,共3页Vacuum Science and Technology

摘　　要：真空的获得和维持是目前FED研究工作中存在的主要困难之一。本文研究了在现有的传统封接排气以及消气工艺的实验条件下 ,进行了多种工艺改进 :设计了一种新型的三层FED器件结构 ,在这种结构中 ,实现了蒸散型消气剂和非蒸散型消气剂的共同使用 ;并采用了气体保护 ,以及电子轰击去气等有效措施 ,实现了FED器件内部持久的高真空度 ,为FED阴极高稳定。Technologies of vacuum pumping and maintaining of the field emission display (FED) devices were modified.The modification includes the novel design of the three plate FED package structure,inert gas protection during sealing,and usage of both volatile and non volatile gettering materials.Moreover,electron bombardment of the phosphor screen is introduced to effectively remove its adsorbed gases in the course of exhausting.Our results show that the new FED cathodes enjoy many strengths,such as better vacuum environment higher stability,and longer lifetime

关 键 词：场发射显示器件 场发射显示 封接 排气 真空获得工艺 真空维持工艺 技术改进 

分 类 号：TN873.3[电子电信—信息与通信工程]