增加表面粗糙度提高神经芯片硅材料的细胞黏附性能  

Improvement of cell adherence to silicon by increasing the roughness of wafer surface

作　　者：侯少平[1] 姬曼[1] 范昱玮[2] 鲁强[1] 杨慧[1] 徐群渊[1] 崔福斋[2] 

机构地区：[1]首都医科大学北京神经科学研究所,北京100054 [2]清华大学材料科学与工程系,北京100084

出　　处：《中国神经科学杂志》2003年第1期9-12,共4页

基　　金：北京市自然科学基金资助项目 (70 3 2 0 0 6)

摘　　要：目的 :硅是制作神经芯片的良好材料 ,硅的普通抛光表面使神经细胞黏附极为困难 ,我们用增加材料表面粗糙度的方法来提高硅的细胞黏附性能。方法 :HF溶液对硅片进行表面蚀刻 ,原子力显微镜测定表面粗糙度。选用胎鼠黑质细胞种植于硅片表面进行培养 ,72h后以酪氨酸羟化酶 (TH)免疫荧光显色 ,荧光显微镜及激光共聚焦系统观察细胞的生长状况 ,并进行扫描电镜观察。结果 :硅材料表面粗糙度的增加可以明显改善细胞的黏附和生长状况 ,生长于硅片表面的多巴胺能神经元表达TH。结论 :增加表面粗糙度可以提高硅材料对细胞的黏附性能 ,改善其生物相容性 ;适于细胞生长的硅片表面平均粗糙度Ra约为 2 0～ 5 0nm ,该技术可作为神经芯片材料表面处理的良好方法。Objective:To improve cell adherence to silicon surface in making neurochip. Methods:A series of the silicon wafers were etched with HF solution for various roughness,and the nano topography was evaluated by Atomic Force Microscopy. The cells from the substantia nigra of fetal rats were planted on the treated wafers and cultured. Then the dopaminergic neurons were stained by fluorescent immunocytochemistry with Tyrosine Hydroxylose(TH) in certain periods after cell planting.The cells on the wafer were also observed by Scan Electric Microscopy. Results:The increased roughness of the wafer suface could improve the adhesion and viability of cultured cells. Dopaminergic neurons could survive and express TH quite well on the wafer. The roughness in a range of 20 50 nm is suitable for adhesion and growth of neurons on the wafer. Conclusion:The treatment for improving the surface roughness would be helpful to the biocompatibility of silicon based electronic device. \[

关 键 词：神经芯片 硅材料 硅 粗糙度 神经细胞 黏附 

分 类 号：R318.08[医药卫生—生物医学工程]