天山雪莲水提取物抗辐射损伤作用的机理研究  

Study on anti-radiation damage mechanism of extract of Saussurea involucrate Kar.Et Kir.

作　　者：高博[1] 梁中琴[1] 顾振纶[1] 

机构地区：[1]苏州大学医学院药理学教研室,苏州中药研究所215007

出　　处：《江苏医药》2003年第1期17-19,I001,共4页Jiangsu Medical Journal

摘　　要：目的　探讨天山雪莲水提取物 (XL)的抗辐射损伤机制。方法　比色法测定XL对水辐解产生的羟自由基的清除作用 ,计算清除率 ;Giemsa染色分析电离辐射引起的人外周血淋巴细胞(PBL)染色体畸变。结果　XL对电离辐射产生的羟自由基有显著的清除作用 ,清除率达到 60 % (与对照组相比P <0 0 0 1) ;它还能明显抑制电离辐射所引起的人外周血淋巴细胞染色体畸变的发生率(与对照组相比P <0 0 1;P <0 0 0 1)。结论　清除羟自由基。Objective To testify the anti-radiation damage mechanism of extract of Saussurea involucrate Kar.Et Kir(XL).Methods The colorimetry was used to measure the content of hydroxyl radical and its clearance rate.And the general giemsa stain was used to analyse chromosome aberration.Result XL could clear the hydroxyl radical produced by ionizing radiation markedly.The clearance rate was 60% ( P< 0 001 vs control group).It also reduced the chromosome aberration of PBL produced by ionizing radiation( P< 0 01, P< 0 001).Conclusion Clearing the radical leads to reduction of the chromosome aberration may be the major mechanism of anti-radiation damage effect of the extract of Saussurea involucrate Kar.Et Kir.

关 键 词：天山雪莲花 辐射损伤 羟自由基 梁色体畸变 中药 

分 类 号：R285.5[医药卫生—中药学]