自模型曲线分辨法校正电感耦合等离子体原子发射光谱中严重谱线重叠干扰  

Corrections of Severely Overlapped Spectral Interference in Inductively Coupled Plasma-Atomic Emission Spectrometry by Self-modeling Curve Resolution

作　　者：张卓勇[1] 朴哲秀[1] 曾宪津[1] 杨金夫[1] 陈新海[1] 关秋荻 

机构地区：[1]中国科学院长春应用化学研究所,长春130022

出　　处：《分析化学》1992年第2期180-182,共3页Chinese Journal of Analytical Chemistry

基　　金：国家自然科学基金;中科院数理化局的资助

摘　　要：对严重重叠的光谱干扰校正,采用较小间隔的光谱扫描测量,并用间隔扫描点的数据计算,可减小计算结果的误差,提高结果的准确性。本方法用于校正Nd359.259nm对Sm359.260nm和V328.939nm对Yb328.937nm谱线重叠干扰,得到了满意的结果。Corrections of severely overlapped spectral interferences in ICP-AES by selfmodeling curve resolution are discussed in the present paper. In resolving highly overlapped lines, intensities are measured with small scan intervals, and the intensities in alternate scan points are used for calculation. This procedure is used to correct spectral interferences of Nd 359.259nm on Sm 359.260nm and V 328.939nm on Yb 328.937nm, and satisfactory results are obtained.

关 键 词：ICP-AES 干扰校正 曲线分辨 谱线 

分 类 号：O657.31[理学—分析化学]