溅射氩气压对TbFeCo薄膜磁和磁光性能的影响  

The Influence of Sputtering Ar Pressure on the Magnetic and Magneto-Optical Properties of Amorphous TbFeCo Films

作　　者：王浩敏[1] 林更琪[1] 李震[1] 李佐宜[1] 

机构地区：[1]华中科技大学电子科学与技术系,湖北武汉430074

出　　处：《磁性材料及器件》2003年第1期1-3,共3页Journal of Magnetic Materials and Devices

摘　　要：研究了射频磁控溅射的溅射氩气压的变化对TbFeCo薄膜的磁和磁光特性的影响,以及不同溅射氩气压下TbFeCo薄膜退火后的特性。溅射氩气压的变化通过改变表面状态影响TbFeCo薄膜矫顽力和克尔角,另外,溅射氩气压的变化会影响被溅射原子轰击薄膜的速度,从而影响TbFeCo薄膜的垂直磁各向异性、矫顽力、磁光克尔效应。In this paper, the influence of Ar pressure on magnetic and magneto-optical properties of amorphous RE-TM(TbFeCo) films prepared by RF magnetron sputtering is systematically analyzed. At the same time, the characteristics of magneto-optical RE-TM (TbFeCo) films after annealing have been studied. Ar partial pressure influences the thin film surface conditions to change coercive force Hc and Kerr angleθK of TbFeCo films and affects sputtered atoms velocity to influence magnetic anisotropy Ku , coercive force Hc and magneto-optical effect of TbFeCo films.

关 键 词：TbFeCo薄膜 射频磁控溅射 氩分压 磁光特性 磁光存储 矫顽力 克尔效应 

分 类 号：O482.5[理学—固体物理]