含季铵碱基及丙烯酸酯基的酚醛树脂的感光性能  

Photocrosslinking properties of water soluble quaternary ammonium hydroxide group-containing acrylic phenolic resin

作　　者：高玉[1] 甘志伟[1] 詹学贵[1] 谢洪泉[1] 谢子汝 

机构地区：[1]华中科技大学化学系,湖北武汉430074 [2]无锡绿田化工公司,江苏宜兴214265

出　　处：《石化技术与应用》2003年第1期5-7,共3页Petrochemical Technology & Application

摘　　要：研究了作为新型水显影阻焊剂组分的含丙烯酸酯基及季铵碱基的酚醛树脂的各种感光条件。结果表明 ,不同光引发剂的引发活性从高到低按以下次序排列 :二苯甲酮 (BP)、2 -丙基硫杂蒽酮 (ITX)、2 ,2 -二乙氧基苯乙酮 (DEAP)、Michler酮 (MK)、蒽醌 (AQ)。在用量低时 ,则ITX的活性最高。几种引发剂的组合产生了很明显的协同效应 ,特别是DEAP +MK的组合最有效 ,其次为ITX +MK。含叔胺结构的增效剂均能促进光引发剂的作用 ,其中以对 -二甲基氨基苯甲酸乙酯 (EDAB)的增效作用最大。稀释性单体以二乙二醇二丙烯酸酯 (DEDA)效果最好。A new water developable,photosensitive phenolic resin containing quaternary ammonium hydroxide groups and acrylate groups(AQHPR) was synthesized.Various photocrosslinking conditions for the soldering mask containing the resin (AQHPR) were studied.It was shown that the activity of various photoinitiators decreased as follows:BP>ITX>DEAP>MK>AQ,and some combined photoinitiators exhibited very obvious synergistic effects,especially DEAP+MK and ITX+MK.EDAB acted as a very good accelerator and DEDA was a good diluent monomer for the soldering mask.

关 键 词：含季铵碱基 丙烯酸酯基 酚醛树脂 感光性能 感光高分子 环氧酚醛树脂 水溶性高分子 季铵碱 水显影阻焊剂 

分 类 号：TQ323.1[化学工程—合成树脂塑料工业]