钒氧化物薄膜的拉曼散射  

Raman Scattering Studies of Vanadium Oxide Thin Films

作　　者：王学进[1] 费允杰[1] 熊艳云[1] 聂玉昕[2] 冯克安[1] 

机构地区：[1]中国科学院物理研究所表面物理国家重点实验室 [2]中国科学院光物理重点实验室,北京100080

出　　处：《光散射学报》2001年第4期235-239,共5页The Journal of Light Scattering

摘　　要：用射频磁控溅射以纯金属钒做靶材在氩氧混合气体中制备了钒氧化物 (VO2 (B)、V6O1 3、V2 O5)薄膜。报导了钒氧化物薄膜的拉曼光谱 ,结合这些钒氧化物不同的结构特点 。Vanadium oxide (VO 2(B), V 6O 13, V 2O 5) films have been deposited by RF magnetron sputtering using pure V (99 65%) as target and Ar-O 2 as reactive gases The Raman spctra of vanadium oxide thin films were reported Classification of Raman spectra for vanadium oxide films was also discussed according to different structural characterization

关 键 词：钒氧化物薄膜 拉曼散射 拉曼光谱 结构特点 

分 类 号：O484.41[理学—固体物理]