Ni-P化学镀层在动态加载条件下的摩擦学性能研究  

TRIBOLOGICAL BEHAVIOR OF ELECTROLESS PLATING Ni-P DEPOSITION UNDER DYNAMIC LOADING

作　　者：黄林国[1] 李曙[2] 李诗卓[2] 

机构地区：[1]台州职业技术学院九峰分院,台州318020 [2]中国科学院金属研究所,沈阳110016

出　　处：《理化检验（物理分册）》2003年第3期121-124,128,共5页Physical Testing and Chemical Analysis(Part A:Physical Testing)

摘　　要：利用单摆划痕法的动态加载特性 ,研究了Ni P化学镀层本身的摩擦学性能。分析讨论了磷含量和热处理制度对单摆划痕法测定的比能耗、摩擦系数的影响。切向动态硬度 (HT)、法向动态硬度 (HN)和比能耗 (e)在评价材料耐磨性方面比显微硬度 (HV)Tribological behavior of electroless plating Ni P deposition has been studied using a single pass pendulum scratching tester with dynamic loading. The influences of phosphorus content and heat treatment on specific energy consumption and friction coefficient, measured with single pass pendulum scratching tester, are discussed. Tangential dynamic hardness(H T), normal dynamic hardness(H N) and specific energy consumption( e ) are more creditable than microhardness(HV) on evaluation of wear resistance.

关 键 词：NI-P化学镀层 动态加载 塑脆转变 摩擦学性能 单摆划痕法 

分 类 号：TQ153[化学工程—电化学工业] TG115.58[金属学及工艺—物理冶金]