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作 者:冯文辉[1] 管自生[1] 蒋峰芝[1] 张金彪[1] 宋延林[1] 江雷[1]
出 处:《高等学校化学学报》2003年第4期745-747,共3页Chemical Journal of Chinese Universities
基 金:"九七三"国家重大基础研究项目 (批准号 :19990 64 4 5 0 4)资助
摘 要:The dynamic wetting of water spreading on TiO 2 and TiO 2 SiO 2 films prepared by sol gel method and subsequently treated by air plasma and UV irradiation was investigated. Water completely spread on TiO 2 surface within 3 s and its dynamic contact angles can be expressed by a power law θ d= k(t+a) -n with the n value 0.98. Less than 50%(molar fraction) SiO 2 addition can accelerate the dynamic water spreading rate on the TiO 2 SiO 2 films and the optimum molar fraction of SiO 2 amount corresponding to as annealed, air plasma, and UV irradiation treatment process is 15%, 10% and 20%, respectively.The dynamic wetting of water spreading on TiO 2 and TiO 2 SiO 2 films prepared by sol gel method and subsequently treated by air plasma and UV irradiation was investigated. Water completely spread on TiO 2 surface within 3 s and its dynamic contact angles can be expressed by a power law θ d= k(t+a) -n with the n value 0.98. Less than 50%(molar fraction) SiO 2 addition can accelerate the dynamic water spreading rate on the TiO 2 SiO 2 films and the optimum molar fraction of SiO 2 amount corresponding to as annealed, air plasma, and UV irradiation treatment process is 15%, 10% and 20%, respectively.
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