在厚靶分析中外标法的表面形状校正  

Surface Shape Correction in Thick Sample Measurement Using an Outer Mark Membrane

作　　者：梁宝鎏[1] 孙大泽[1] 

机构地区：[1]香港城市大学

出　　处：《岩矿测试》2003年第1期10-14,共5页Rock and Mineral Analysis

基　　金：香港城市大学Strategic研究基金(7000867)

摘　　要：在厚靶的非破坏性X射线荧光分析中,以钇做外标元素,研究了不同样品形状及与源、探测器距离不同时,引起接收到元素荧光强度差异的校正方法。给出了对不同形状瓷片中元素特征峰计数校正前后的比较。探讨了此种方法带入的测量误差。In nondestructive Xray fluorescence analysis with thick target, correction method for difference in fluorescence intensity of elements due to sample shape and different distance to the source detector with yttrium as an outer mark element was studied. Comparison of element characteristic peak counts for porcelain pieces with different shape before and after correction were made. The measurement error brought from this method was also discussed.

关 键 词：厚靶分析 外标法 荧光强度 X射线荧光分析 钇 外标元素 探测器 

分 类 号：P575.5[天文地球—矿物学]