磁控溅射有机聚合物衬底ZnO:Al透明导电膜的结构及光电性能研究  

STRUCTURAL,OPTICAL AND ELECTRICAI PROPERTIES OF ZnO:Al FILMS DEPOSITED ON ORGANIC SUBSTRATE BY R.F. MAGNETRON-SPUTTERING

作　　者：马瑾[1] 张士勇[2] 郝晓涛[1] 马洪磊[2] 

机构地区：[1]山东大学物理与微电子学院光电材料与器件研究所,济南250100 [2]长安大学基础部物理组,西安710064

出　　处：《太阳能学报》2003年第1期10-13,共4页Acta Energiae Solaris Sinica

基　　金：国家自然科学基金资助项目 ( 698760 2 5);教育部科学技术研究重点项目 (重点 0 2 165 )

摘　　要：采用射频磁控溅射法在有机薄聚合物膜衬底上制备出铝掺杂的氧化锌 (ZnO :Al)透明导电膜 ,对薄膜的低温制备 (2 5～ 180℃ )、结构和光电特性进行了研究。制备薄膜为多晶膜 ,具有纯氧化锌的纤锌矿结构和 (0 0 2 )择优取向。制备薄膜在可见光区透过率达到 74 % ,最低电阻率为 8.5× 10 -4Ω·cm。ZnO:Al films have been deposited on Polyimide (PI) sheet substrates by r.f. magnetron sputtering technique at low substrate temperature (25～180℃). The properties of structure optics and electricity of the deposited films were investigated. All of the obtained films were polycrystalline with a hexagonal structure with textured (002) to the films with resistivity as low as 8.5×10 -4 Ωcm and the average transmittance over 74% in the visible spectrum have been obtained.

关 键 词：有机衬底 ZNO:AL 光电性质 

分 类 号：TK511.4[动力工程及工程热物理—热能工程]