气压对激光烧蚀Al靶诱导保护气电离的影响  

Effect of Gas Pressure on Protecting Gas Ionizing Induced by Laser Ablating Aluminum

作　　者：李尊营[1] 

机构地区：[1]山东临沂师范学院物理系,山东临沂276005

出　　处：《激光与红外》2003年第2期106-108,共3页Laser & Infrared

摘　　要：用Nd:YAG脉冲激光烧蚀Al靶获得等离子体,脉冲能量固定在145mJ/pulse。用Ar气作保护气,利用时空分辨技术,采集了100Pa、1kPa、10kPa和100kPa气压下等离子体辐射的时空分辨谱。简要描述了各气压下等离子体的辐射特征,详细分析了各气压下Ar的特征辐射规律。根据这些气压下Ar特征谱线的分布特征,简要论述了Ar气电离与气压的关系;用量子理论对此给予全面解释。进一步讨论了环境气体电离机制,认为环境气体对等离子体的连续辐射吸收是诱导环境气体电离的主要机制。With Nd:YAG Pulsed laser beam ablating aluminum target, the energy of a pulsed laser beam was set up to 145mJ. Ar was used as protecting gas. Time-and space-resolved spectra of the plasmas under pressure 100Pa、1kPa、10kPa and 100kPa were acquired with time-and space-resolved technique. The characteristics of the plasma radiating under each pressure were briefly described, and the laws of Ar characteristically radiating were analyzed in detail. Based on the profile of Ar characteristically radiating under these pressures, the relation between protecting gas pressure and it ionizing was briefly discussed, and completely explained with quantum theory. Further more, the mechanism of ambient gas ionizing was investigated. As the result, it was suggested that the main mechanism inducing protecting gas to ionize should be absorption of the plasma continuum radiation by the gas.

关 键 词：激光烧蚀 时空分辨谱 特征谱线 电离机制 量子理论 Al靶 铝靶 保护气电离 

分 类 号：TN248[电子电信—物理电子学] O53[理学—等离子体物理]