量子Heisenberg薄膜磁性的解析研究  

Analytical Study of Magnetism in Quantum Heisenberg Film

作　　者：阎玉立[1] 杨晓莉[2] 陈洪[1] 

机构地区：[1]西南师范大学物理系,重庆400715 [2]涪陵师范学院物理系,重庆涪陵408003

出　　处：《西南师范大学学报（自然科学版）》2003年第3期408-411,共4页Journal of Southwest China Normal University(Natural Science Edition)

摘　　要：采用变分累计展开方法,计算量子Heisenberg薄膜的自发磁化强度到了三级累积展开.结果表明:自发磁化强度依赖于薄膜的层数,在某一临界厚度以下,自发磁化强度随薄膜原子层数的减小而迅速减小.The magnetic properties of spin1/2 quantum Heisenberg film is studied in variational cumulant expansion method. The spontaneous magnetization is calculated to the third order. For thicknesses below a critical thickness, the spontaneous magnetization depends on the number of atomic layers and decreases rapidly as the number of atomic layers is decreased.

关 键 词：量子Heisenberg薄膜 磁性 自发磁化强度 变分累计展开方法 薄膜层数 

分 类 号：O484.43[理学—固体物理]