高功率激光宽光谱减反膜的溶胶-凝胶旋转法制备工艺  

Fabrication of broadband antireflective films by sol-gel spin-coating process for high power lasers

作　　者：魏芸[1] 吕海兵[1] 蒋晓东[1] 唐灿[1] 任寰[1] 李珂[1] 

机构地区：[1]中国工程物理研究院激光聚变研究中心,四川绵阳621900

出　　处：《强激光与粒子束》2003年第7期647-650,共4页High Power Laser and Particle Beams

基　　金：国家自然科学基金重点项目资助课题(2013304);中国工程物理研究院预研基金资助课题(421020607)

摘　　要：　采用溶胶 凝胶法用旋转镀膜工艺在K9玻璃基片上制备出了SiO2和有机硅单层减反膜以及有机硅 SiO2双层减反膜。考察了旋转速度对SiO2和有机硅单层膜的中心透射波长、膜层折射率等基本光学性质的影响,实验确定了双层膜的涂敷工艺。透射光谱测量表明,采用本文工艺条件制备的有机硅 SiO2双层膜在430～800nm范围内透射率达99%以上。The technique to fabricate a doublelayer broadband antireflective (AR) film by solgel spincoating process for high power lasers was investigated. The doublelayer film was composed of a single SiO2 AR coating with reflective index about 13 and silicone coating with reflective index about 1.4. The experimental result showed, when the physical thickness of silicone film and SiO2 AR film were 112nm and 125nm respectively, the doublelayer AR film can be developed with transmission greater than 99% at the waveband range from 430nm to 800nm, which can meet the optical quality of shield glass for the prototype of ShenguangIII facility. 

关 键 词：溶胶-凝胶法 高功率激光 宽光谱减反膜 制备工艺 SIO2 二氧化硅 旋转镀膜工艺 有机硅薄膜 

分 类 号：O484.4[理学—固体物理] TN249[理学—物理]