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作 者:何琛娟[1] 李德华[1] 卢振中[1] 聂玉昕[1] 王学进[2] 袁宏韬[2] 冯克安[2]
机构地区:[1]中科院物理研究所光物理实验室,北京100080 [2]中科院物理研究所表面物理实验室,北京100080
出 处:《光谱学与光谱分析》2003年第3期417-420,共4页Spectroscopy and Spectral Analysis
摘 要:测量了玻璃、熔融石英及蓝宝石衬底上VO2 薄膜变温过程的红外透过率谱 ,对样品相变前后的光学性质进行了研究。特定温度下VO2 薄膜发生相变 ,其光学性质随之发生突变。不同衬底、不同制作工艺影响相变发生的温度以及相变前后光学性质的变化量。蓝宝石衬底上磁控溅射所得的VO2 膜 5 μm处透过率的减小量ΔT为 70 % ,相对变化ΔT TRT为 94 % ,玻璃衬底上磁控溅射所得的VO2 膜 2 5 μm处ΔT =6 4 2 % ,而ΔT TRT高达 98% ,接近于 1。Optical transmission spectra of VG films on glass, fused silica, and sapphire were recorded and analyzed during heating process. Thermally induced phase transition of VO2 films occurred at a certain temperature, associated with abrupt changes in optical properties. The transition temperature and the contrast of the optical properties depended on the substrate and the deposit method used. The change in transmittance AT at 5 mum of VO2 films deposited on sapphire by RF magnetron sputtering was 70%, and the corresponding relative change DeltaT/T-RT was 94%. For the VO2 films deposited on glass by RF magnetron sputtering, AT at 2.5 mum was 64.2%, and DeltaT/T-RT was as high as 98%.
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