二代微光成像器件阴极材料放气成份分析  

Desorptions of Photocathode Materials Used in Fabrication of 2nd Generation Low Light-Level Imaging Devices

作　　者：徐江涛[1] 

机构地区：[1]西安应用光学研究所,西安710100

出　　处：《真空科学与技术》2003年第3期219-222,共4页Vacuum Science and Technology

摘　　要：用四极质谱计对光电阴极碱源材料放气成份进行质谱分析 ,给出了分析结果 ,并对所放出有害气体给制备光电阴极带来的影响进行了讨论。Desorption of various gases from photo cathode materials was studied with quadrupole mass spectrometer(QMS).The quantitative results may be of technological interest in preparation of the photo cathode materials.

关 键 词：微光 成像器件 阴极材料 有害气体 

分 类 号：TN224[电子电信—物理电子学]