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出 处:《冶金分析》2003年第3期28-30,共3页Metallurgical Analysis
摘 要:以电感耦合等离子体光谱法(ICP-AES)直接同时进行钼铁中基体元素Mo和微量杂质元素Si,Sb,Sn,Cu的测定。试验了元素的干扰情况,优化了仪器工作条件,采用钇内标校正与同步背景校正、K系数校正相结合的方法消除基体及试液进样的物理化学影响干扰。精密度、回收率、检出限、标准样品分析对照均取得了满意的结果。A method for simultaneous determination of micro amounts of silicon,copper,antimony,tin and matrix molybdenum in the molybdenumiron alloy was proposed The operating condition of the instrument was optimizedYttrium as the element of internal standard was used to correct physical and chemical interferences caused by samplingThe interferences of coexisting elements and matrix effects were eliminated by the background correction and coefficent correctionRSD,detection limits for trace elements and contrast of analytical results were discussedThe results were satisfactory
关 键 词:钼铁 ICP-AES 电感耦合等离子体光谱法 钼 硅 铜 铅 锡
分 类 号:TG115.3[金属学及工艺—物理冶金]
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