表面起伏光栅形成速率的影响规律Ⅱ.偶氮生色团上甲基取代基的影响  

INFLUENCES ON INSCRIPTION RATES OF SURFACE RELIEF GRATINGS Ⅱ. METHYL SUBSTITUENT EFFECT OF AZO CHROMOPHORES

作　　者：和亚宁[1] 王晓工[1] 周其庠[1] 

机构地区：[1]清华大学材料科学与工程研究院化工系高分子研究所,北京100084

出　　处：《高分子学报》2003年第4期549-553,共5页Acta Polymerica Sinica

基　　金：国家自然科学基金 (基金号 5 9873 0 13 )资助项目

摘　　要：设计并合成了偶氮生色团上含有不同数目甲基取代基的环氧树脂类偶氮高分子 .研究了偶氮生色团上甲基取代对表面起伏光栅形成速率的影响规律 .实验结果表明 ,在偶氮生色团上引入甲基取代基使光栅形成的速率明显减慢 ,引入甲基数目越多 ,光栅形成速率就越慢 .A series of polymers containing azo chromophores with different number of methyl substituents have been designed and synthesized.Three epoxy based precursor polymers were prepared by reactions of diglycidyl ether of bisphenol A with aniline,3 methylaniline,and 3,5 dimethylaniline respectively.The precursor polymers were reacted with diazonium salt at the final stage of the synthetic routes to introduce donor acceptor type azo chromophores.The polymers synthesized were characterized by using various spectroscopic methods and thermal analysis.Photoprocessibility of photoinduced surface relief gratings on the polymer films was studied carefully.With the same irradiating light intensity and approximately equal film thickness,the rates of SRG formation significantly depend on the number of methyl substituents on the azo chromophores.For polymers with the same type of electron withdrawing group,the inscription rates decrease with the increase of the number of methyl substituents on the azo chromophores.

关 键 词：表面起伏光栅 形成速率 影响规律 偶氮生色团 甲基取代基 偶氮聚合物 环氧树脂 

分 类 号：O631[理学—高分子化学]