直流脉冲电泳沉积法制备TiN涂层的研究  

Study of Fabricating Titanium Nitride Coatings through Pulsed-Direct Current Electrophoretic Deposition

作　　者：钱艳红[1] 李秀燕[1] 张伟华[1] 曹铃[1] 刘瑞萍[1] 

机构地区：[1]太原理工大学物理与光电工程学院,太原030024

出　　处：《太原理工大学学报》2015年第6期661-665,共5页Journal of Taiyuan University of Technology

基　　金：国家自然科学基金青年科学基金资助项目:体心立方金属中螺位错运动机理的温度效应理论研究(51401142)

摘　　要：为解决电泳沉积过程中的水分解问题,采用直流脉冲电泳沉积法制备304不锈钢负载型TiN涂层,探究涂层的形成规律,并利用扫描电子显微镜(SEM)、X射线衍射(XRD)及辉光放电光谱(GDS)等检测手段对TiN涂层的形貌、物相及成分进行了表征。结果表明,采用直流脉冲电压可以减弱水电解对TiN涂层带来的负面影响;脉冲电压频率对涂层的形貌及沉积速率有重要影响,在5~30Hz频率范围,可形成较为均匀致密的TiN涂层,且TiN的沉积速率随频率的增大而逐渐减小;在TiN涂层与不锈钢基体间的界面处,各元素含量均随深度的变化呈梯度分布,有利于涂层与基体间的良好结合。本研究将为水悬浮液中电泳沉积不锈钢负载TiN涂层的制备提供理论基础。To tackle the problem of water hydrolysis during electrophovetic deposition(EPD)process in aqueous suspension,the use of pulsed-direct current(DC)fields instead of DC fields is an attractive solution.In this work,titanium nitride(TiN)coatings were prepared on 304 stainless steel(SS)substrates through pulsed-DC EPD in an aqueous suspension of nanosized TiN powder and the growth rules of TiN coatings were studied.The scanning electron microscopy(SEM),X-ray diffraction(XRD)and glow discharge spectrometry(GDS)were employed to characterize the samples' morphology,structure and composition.It turned out that the negative influence on TiN coatings from water hydrolysis was significantly relieved by adopting pulsed-DC voltage.The frequency is a key factor to influence the depositing speed and morphology of TiN coatings.In the range of 5~30 Hz,smooth and uniform TiN coatings were obtained and the deposition rate of TiN coating decreased with increasing frequency.The elements in the interface layer between TiN coating and SS substrate showed gradient distribution,which is beneficial to the adhesion strength of TiN coating.This study will provide theoretical reference for the preparation of SS-based TiN coatings via EPD in aqueous suspension.

关 键 词：氮化钛涂层 直流脉冲电泳沉积 脉冲电压频率 不锈钢 

分 类 号：TG174.4[金属学及工艺—金属表面处理]