脉冲激光沉积技术及其应用  

Pulsed laser deposition and its application

作　　者：陈传忠[1] 包全合[1] 姚书山[1] 雷廷权[1] 

机构地区：[1]山东大学材料科学与工程学院,济南250061

出　　处：《激光技术》2003年第5期443-446,共4页Laser Technology

基　　金：山东省优秀中青年科学家奖励基金资助项目

摘　　要：薄膜材料已在微电子元件、超导材料、生物材料等方面得到广泛应用 ,为了得到高质量的薄膜材料 ,脉冲激光沉积技术受到了广泛的关注。介绍了脉冲激光沉积技术的原理、特点 ,综述了其在制备半导体、高温超导、类金刚石、铁电、生物陶瓷薄膜等方面的应用和研究现状 。Thin film materials have been widely used in micro electronics,superconductor,and bioceramics materials. In order to obtain high quality thin films,deposition have attracted more attention. In this paper the principle,the characteristics of the pulsed laser deposition technique are introduced. Its applications in semiconductor,high temperature superconductor,diamondlike,ferroelectric and bioceramics thin films and its current research status are reviewed. The future application trend is prospected.

关 键 词：脉冲激光沉积 薄膜 应用 研究现状 

分 类 号：TN249[电子电信—物理电子学]