液晶共面取向的等离子处理方法  

Plasma Treatment as a Method of In-Plane Liquid Crystal Alignment

作　　者：Oleg Yaroshchuk 郭斌[2] 熊绍珍 

机构地区：[1]不详 [2]南开大学

出　　处：《现代显示》2003年第5期28-32,共5页Advanced Display

摘　　要：在受等离子辐照过的一些有机和无机的基板上,获得了高质量的液晶共面取向。与已知的用来改善顶部锚定及预倾角各向同性的等离子处理方法不同,新方法是将等离子束调整到倾斜射向待取向的基板。在所用的辐射参数范围内,所有基板上的LC取向的易取向轴(easyaxis)都平行于等离子体传播方向。研究了LC的预倾角和锚定能与等离子束的入射角、辐照时间、能量以及辐照电流密度等的依赖关系。经等离子处理过的基板上,方位角、锚定能与用光取向方法得到的相近,而预倾角与摩擦产生的类似。透过率-电压曲线与等离子处理的和摩擦工艺处理的非常接近。与摩擦取向相同,等离子诱导的取向具有很高的温度和光照的稳定性。也考虑了采用等离子/偏振紫外光和等离子/摩擦处理等组合方法来制作LC图形。The high quality planar alignment of LC is obtained on a number of organic and non-organic substrates subjected to plasma irradiation. In contrast to the known methods of treatment in isotropic plasma used to modify zenithal anchoring and pretilt angle, new method operates with collimated plasma beams directed obliquely to the aligning substrates. In the range of irradiationparameters we used, the easy axis of LC alignment on all substrates is parallel to plasma propagation direction. Dependencies of the LC pretilt angle and anchoring energy on the incidence angle of the plasma beam, time of irradiation, energy and current density of the irradiation are investigated. The azimuth anchoring energy on the plasma treated substrates is close to that obtained by photoalignment method, whereas the pretilt angle is comparable with that generated by rubbing. The transmittance vs voltage curves are very similar for plasma and rubbing processes.Same as rubbing alignment, plasma induced alignment is highly thermally and photo-stable. The combined treatments plasma/polarized UV light and plasma/rubbing are considered as methods of LC patterning.

关 键 词：液晶共面取向 等离子处理 易取向轴 预倾角 锚定能 摩擦处理 

分 类 号：TN141.9[电子电信—物理电子学]