实时灰阶掩膜技术制作微透镜列阵  

Real-time Grey-tone Mask Technique for Fabrication of Microlens Array

作　　者：彭钦军[1] 郭永康[1] 曾阳素[1] 刘世杰[1] 陈波[1] 肖啸[1] 

机构地区：[1]四川大学物理系信息光学研究中心,四川成都610064

出　　处：《中国激光》2003年第10期893-896,共4页Chinese Journal of Lasers

基　　金：国家自然科学基金 (批准号 :6 99780 14 )资助项目

摘　　要：提出一种制作连续微结构的实时灰阶掩膜技术 ,它将液晶显示 (LCD)系统和投影光刻系统相结合 ,利用液晶显示系统实时显示一系列二值图形来获得连续的灰度记录 ,给出了原理分析。基于部分相干光成像理论 ,进行了微透镜制作的计算机模拟。建立了实验装置 ,并采用全色卤化银明胶 (Kodak131)通过酶刻蚀得到半径为 5 9 33μm ,深为 1 6 38μm的 5 6× 4Real-time grey-tone mask technique to fabricate the microstructures is presented. It combines the advantages of programmable digital liquid crystal display (LCD) system and projection photolithography system, utilizing the LCD panel to display a serial of patterns which transfer light intensity distribution with representative of height information of 3D-profile into exposure time distribution. As a result, this continuous grey image on the recording plate is obtained. The principle is explained. Based on partial coherent imaging theory, the process to fabricate the microlens is simulated. As an experiment, the microlens array is fabricated on panchromatic silver-halide sensitized gelatin with enzyme etching. The radius of microlens and etching depths are 59.33 μm and 1.638 μm, respectively.

关 键 词：物理光学 实时灰阶掩膜 液晶显示 微透镜列阵 光刻 

分 类 号：TN305.7[电子电信—物理电子学]