Bi-Ni合金膜在有机溶剂中的电沉积制备  

Preparation of Bi-Ni alloy films by electrodeposition in organic bath

作　　者：李高仁[1] 童叶翔[1] 刘冠昆[1] 

机构地区：[1]中山大学化学与化学工程学院,广州510275

出　　处：《中国有色金属学报》2003年第5期1297-1301,共5页The Chinese Journal of Nonferrous Metals

基　　金：广东省自然科学基金资助项目 (0 112 15 );北京大学稀土材料化学及应用国家重点实验室开放课题基金资助项目

摘　　要：利用循环伏安法和恒电位电解法探讨了室温条件下LiClO4二甲基亚砜 (DMSO)体系中Bi Ni合金膜的电化学制备 ;利用SEM ,EDS和XRD分析了沉积膜的微观表面形貌 ,组成和相结构 ;研究了沉积电位、电流密度、主盐浓度以及NiCl2 与Bi(NO3 ) 3 的浓度比对沉积膜质量的影响。实验结果表明 :在Bi(NO3 ) 3 NiCl2 LiClO4DMSO体系中 ,控制恰当的体系组成和沉积条件 ,可得到表面均匀、附着力强、有金属光泽的灰色非晶态Bi Ni合金膜 ,其中Ni的质量分数可达 1.82 %～ 38.0 8% ,合金膜在 2 6 8℃热处理 1h后 ,可形成晶态的Bi Ni合金相。The cyclic voltammetry and potentiostatic electrolysis were used to investigate the preparation of Bi-Ni alloy films in LiClO_4-DMSO system. The effects of several factors including the potential and current density of deposition, concentrations of main salts and the concentration ratio of NiCl_2 to Bi(NO_3)_3 were studied. The results indicate that Bi-Ni alloy films containing Ni 1.82%38.08% is prepared in Bi(NO_3)_3- NiCl_2-LiClO_4-DMSO system by controlling the system composition and deposition conditions, which is gray, uniform, metallic luster and adheres firmly to the copper substrates. After heat treatment to deposited film at 268 ℃ for 1 h, the alloy phase of Bi-Ni can be found in XRD pattern.

关 键 词：Bi-Ni合金膜 有机溶剂 电沉积 制备 循环伏安法 恒电位电解法 DMSO 

分 类 号：TM27[一般工业技术—材料科学与工程]