应用两点法对EDG器件的优化设计  

Optimization Design of EDG Devices by Means of Two-Point Method

作　　者：文泓桥[1] 石志敏[1] 盛钟延[1] 何赛灵[1] 周勤存[1] 

机构地区：[1]浙江大学现代光学仪器国家重点实验室光及电磁波研究中心,浙江杭州310027

出　　处：《光电工程》2003年第5期11-14,共4页Opto-Electronic Engineering

基　　金：浙江省科技计划重大项目资助(001101027)

摘　　要：应用两点法对EDG器件进行了优化设计,将器件中凹面光栅对中心波长的无像差点由一个 增加到两个,并由此确定各光栅槽面的位置及输出点的位置。利用标量波动衍射理论进行了数值模拟,结果表明,该设计能明显降低系统像差,改变了传统设计方法在大通道数情况下像差过大、边缘通道性能劣化等问题。Optimization design for EDG devices is carried out by two-point method, thus increases the aberration-free point of concave grating for central wavelength in a device from 1 to 2 and from this the positions of various grating slot bottoms and the positions of output points can be determined. Numerical simulation is carried out by means of scalar fluctuation and diffraction theory. The simulation results show that the design obviously lowers system aberration, and solves the problems such as too large aberration and performance degradation of edge channel in large channel number in traditional method.

关 键 词：蚀刻衍射光栅 两点法 优化设计 波分复用 

分 类 号：TN256[电子电信—物理电子学]