Fe-Zr-B非晶薄膜退火后的组织与性能  

Properties and Structures of Fe -Zr -B Amorphous Thin Fihns after Annealing

作　　者：徐炜新[1] 程新利[2] 金惠娟[1] 许裕生[3] 

机构地区：[1]上海钢铁研究所,上海200940 [2]中科院上海微系统与信息技术研究所,上海200050 [3]江苏省苏州大学,苏州215006

出　　处：《热处理》2003年第4期15-17,24,共4页Heat Treatment

摘　　要：用直流磁控溅射法成功制备了Fe-Zr-B非晶薄膜。用X-射线衍射、透射电镜研究了薄膜不同退 火温度后的组织与性能。研究结果表明,薄膜在550℃退火时,其磁感应强度最高,主要原因是因为 其结构发生了有利于磁化的bcc相的转变。The amorphous Fe - Zr - B thin films have been prepared by DC magnetron sputtering. The properties and structures of it afrer annealing at different temperature has been studied by XRD and TEM. The Intensity of magnetizatin of Fe - Zr - B film after annealed at 550℃ is best due to transformation of structures to bcc phase advantageous to magnetizing.

关 键 词：Fe-Zr-B合金 非晶薄膜 热处理 退火 组织 性能 

分 类 号：TM27[一般工业技术—材料科学与工程]