脉冲直流等离子体增强化学气相沉积Ti-Si-N纳米薄膜的摩擦磨损特性  

Friction and Wear Characteristics of Nano-Structured Ti-Si-N Films on a High Speed Steel Substrate Prepared by Pulsed-Direct Current Plasma Enhanced Chemical Vapor Deposition

作　　者：马大衍[1] 王昕[1] 马胜利[1] 徐可为[1] 徐洮[2] 

机构地区：[1]西安交通大学金属材料强度国家重点实验室,陕西西安710049 [2]中国科学院兰州化学物理研究所固体润滑国家重点实验室,甘肃兰州730000

出　　处：《摩擦学学报》2003年第6期476-479,共4页Tribology

基　　金：国家863高技术项目(2001AA338010);欧盟第五框架计划项目(GRD2001-40419);中国科学院兰州化学物理研究所固体润滑国家重点实验室资助项目(200101).

摘　　要：采用工业型脉冲等离子体增强化学气相沉积设备,通过调节氯化物混合比例控制薄膜成分,在高速钢基材表面于550℃下沉积由纳米晶TiN和纳米非晶Si3N4组成的Ti-Si-N复合薄膜;采用扫描电子显微镜、透射电子显微镜、X射线衍射仪及X射线光电子能谱仪分析了薄膜的结构、组成和化学状态;采用球-盘高温摩擦磨损试验机考察了薄膜同GCr15钢对摩时的摩擦磨损性能.结果表明:薄膜的Si含量在0%～35%范围内变化,随着Si含量增大,薄膜沉积速率增大,但薄膜由致密形态向大颗粒疏松态过渡;薄膜的晶粒尺寸为7～50nm;Ti-Si-N薄膜的显微硬度高于TiN的硬度,最高可达60GPa;引入少量Si可以显著改善TiN薄膜的抗磨性能,但薄膜的摩擦系数较高(室温下约0.8、400℃下约0.7);随着Si含量的增加,Ti-Si-N薄膜的耐磨性能有所降低,其原因在于引入导电性较差的Si元素使得薄膜的组织变得疏松.Ti-Si-N nanocomposite thin films composed of nanocrystalline TiN and nano-sized amorphous Si3N4 were deposited on a high speed steel substrate by pulsed-direct current plasma enhanced chemical vapor deposition at 550°C on an industrial set-up, by properly adjusting the mixing ratio of the chlorides as the starting materials to control the composition of the films. The friction and wear behaviors of the Ti-Si-N nanocomposite films in sliding against SAE52100 steel at ambient temperature and 400°C were comparatively investigated with that of TiN film on a ball-on-disc friction and wear tester. The microstructures, compositions and chemical features of the films were analyzed by means of scanning electron microscopy, transmittance electron microscopy, X-ray diffraction and X-ray photoelectron spectroscopy. It was found that the Si content of the films was ranged from 0% to 35%. The deposition rate of the films increased with the increase of Si content, while the grains size coarsened therewith. The Ti-Si-N films had a grain size in the range of 7-15 nm and showed much higher micro-hardness and much better wear-resistance than the TiN film, though they recorded large friction coefficients (about 0.8 at room temperature and 0.7 at 400°C). Moreover, the Ti-Si-N films with larger Si contents had worse wear-resistance than the ones with smaller Si contents, which could be attributed to the enhanced grain size coarsening of the Ti-Si-N films with higher Si content of poor electric conductivity.

关 键 词：等离子体增强化学气相沉积(PCVD) Ti—Si—N 纳米薄膜 摩擦磨损性能 

分 类 号：TG174.44[金属学及工艺—金属表面处理]