基于空间光调制器的灰度掩模制作系统  

Manufacturing System for Gray-scale Masks Based on the Spatial Light Modulator

作　　者：颜树华[1] 戴一帆[1] 吕海宝[1] 李圣怡[1] 

机构地区：[1]国防科技大学机电工程与自动化学院,湖南长沙410073

出　　处：《中国激光》2004年第1期45-47,共3页Chinese Journal of Lasers

基　　金：国家自然科学基金 (编号 :5 0 0 0 5 0 2 2 )资助项目

摘　　要：提出了基于空间光调制器的灰度掩模制作新方法。分析了该方法的基本原理 ,构造了相应的实验系统。同时制作了闪耀光栅、菲涅耳透镜以及Dammann光栅等二元光学器件的灰度掩模。该方法采用逐个图形曝光的方式使其具有内在的并行特性 ,可大大提高灰度掩模的制作速度和精度 。The novel manufacturing method for gray-scale masks based on the spatial light modulator has been proposed. In this paper, the basic principle of this method was analyzed, and the corresponding experimental system was fabricated. At the same time, the gray-scale masks of some binary optical elements such as blazed grating, Fresnel lens and Dammann grating have been actually fabricated. This system has intrinsic parallel characteristic owing to its stepper exposure mode, therefore it can improve the manufacturing speed and precision of gray-scale masks with low cost.

关 键 词：光电子学 灰度掩模制作系统 空间光调制器 二元光学 

分 类 号：TN305.7[电子电信—物理电子学]