Electrochemical Behavior of Er(Ⅲ) In N, N-dimethylformamide  

作　　者：李高仁 童叶翔 刘冠昆 袁定胜 徐常威 王宇 

机构地区：[1]School of Chemistry and Chemical Engineering, Zhongshan University

出　　处：《中国有色金属学会会刊：英文版》2002年第6期1210-1213,共4页Transactions of Nonferrous Metals Society of China

基　　金：Project(0 0 0 7942 10 0 5 )supportedbytheThousand Hundred TentalentProjectFoundationofEducationOfficeofGuangdongProvinceChina

摘　　要：The cyclic voltammetry, current time curve at potential step and potential time curve of galvanostatic method were used to investigate the electrochemical behavior of Er(Ⅲ) in ErCl 3 LiClO 4 DMF(N, N dimethylformamide) system on Pt and Cu electrodes. Results indicate that the electroreducation of Er(Ⅲ) to Er(0) is irreversible on Pt and Cu electrodes, the diffusion coefficient and electron transfer coefficient of Er(Ⅲ) in 0.01 mol/L ErCl 3 0.1 mol/L LiClO 4 DMF system at 303 K are 1.96×10 -6 cm 2·s -1 and 0.081 respectively. The Er metal film was prepared by galvanostatic electrolysis on Cu electrode in ErCl 3 LiClO 4 DMF system at 40 A·m -2 (current density). The deposites composed of Er over 95%(mass fraction) were obtained.The cyclic voltammetry, current time curve at potential step and potential time curve of galvanostatic method were used to investigate the electrochemical behavior of Er(Ⅲ) in ErCl 3 LiClO 4 DMF(N, N dimethylformamide) system on Pt and Cu electrodes. Results indicate that the electroreducation of Er(Ⅲ) to Er(0) is irreversible on Pt and Cu electrodes, the diffusion coefficient and electron transfer coefficient of Er(Ⅲ) in 0.01 mol/L ErCl 3 0.1 mol/L LiClO 4 DMF system at 303 K are 1.96×10 -6 cm 2·s -1 and 0.081 respectively. The Er metal film was prepared by galvanostatic electrolysis on Cu electrode in ErCl 3 LiClO 4 DMF system at 40 A·m -2 (current density). The deposites composed of Er over 95%(mass fraction) were obtained.

关 键 词：Er(Ⅲ) 铒 氮-氮二甲基 扩散系数 电子转移系数 DMF 电镀 稀土 电沉淀 

分 类 号：O646[理学—物理化学]