红外焦平面阵列非均匀性及校正分析  

Nonuniformity and Its Correction Principle of Infrared Focal Plane Arrays

作　　者：周慧鑫[1] 李庆[1] 刘上乾[1] 周铭[2] 赖睿[1] 

机构地区：[1]西安电子科技大学技术物理学院,陕西西安710071 [2]华北光电技术研究所,北京100015

出　　处：《激光与红外》2003年第6期446-448,共3页Laser & Infrared

摘　　要：大规模红外焦平面阵列器件固有的非均匀性,严重地制约着红外成像系统的性能,这是其应用中必须解决的一个关键问题。本文详尽地分析了产生非均匀性的各种因素,并对其校正原理进行了阐述,最后给出了基于参考源校正算法的仿真结果。Infrared focal plane arrays (IRFPA) imaging system performance is seriously limited by the inherent nonuniformity of IRFPA, so the nonuniformity is one of the key porblems need to be solved in the IRFPA applications. The forming mechanism and the correction principle of the nonuniformity are presented in the paper. Then the emulation experimental results of nonuniformity correction are given.

关 键 词：红外焦平面阵列 非均匀性 红外成像 校正原理 

分 类 号：TN215[电子电信—物理电子学]