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出 处:《青岛大学学报(工程技术版)》2003年第4期63-66,共4页Journal of Qingdao University(Engineering & Technology Edition)
摘 要:利用射频磁控溅射法,以聚四氟乙烯为靶材,在聚酰亚胺(PI)薄膜上沉积纳米氟碳膜。利用扫描电子显微镜(SEM)、透射电子显微镜(TEM)、原子力显微镜(AFM)观察了纳米氟碳膜的表面形貌。通过优化放电条件,在PI薄膜上得到了一层致密均匀的由纳米粒子组成的氟碳膜。利用X射线光电子能谱(XPS)研究了膜的结构及其对放电条件的依赖性。结果表明:这种纳米氟碳膜由—CF3,—CF2—,—CF—和—C—4个组分构成。水接触角的测量数据表明:在PI基底上沉积纳米氟碳膜可以提高其憎水性能。In order to obtain fluorocarbon films on PI substrate, magnetron sputtering method was used to prepare them. The morphology of the sputter-deposited films was observed by means of Scanning Electron Microscopy (SEM), Atom Force Microscopy (AFM) and Transmission Electron Microscopy (TEM). By optimizing discharge conditions, quite uniform nano-sized particles had been obtained. The structure of fluorocarbon films was also investigated by means of XPS, and the result indicated that fluorocarbon macromolecule composes of four components, —CF_(3),—CF_(2)—, —CF—, —C—. From the data of surface contact angle, We found that fluorocarbon film enhanced the hydrophobicity.
关 键 词:聚酰亚胺基纳米氟碳膜 结构 射频磁控溅射 表面形貌 接触角 憎水性能
分 类 号:TQ323.7[化学工程—合成树脂塑料工业]
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