多目标复合半实物仿真系统的杂散光分析  

Stray light analysis for multi-target compounding hardware-in-loop system

作　　者：范志刚[1] 胡海力[1] 陈守谦[1] 左宝君[1] 倪辰[1] 

机构地区：[1]哈尔滨工业大学空间光学工程研究中心,黑龙江哈尔滨150001

出　　处：《应用光学》2014年第2期205-209,共5页Journal of Applied Optics

基　　金：航空科学基金重点实验室类资助项目(20130177003)

摘　　要：杂散光分析已经成为光学系统设计中必须考虑的关键因素之一。基于蒙特卡洛法,利用TracePro软件进行建模仿真,对多目标复合半实物仿真系统的杂散光进行了分析。仿真结果表明仿真系统的杂散光主要来自两方面:一是扩束光束经主反射镜边缘反射的未复合光束;另一个是由于仿真系统关键元件自发辐射产生的杂散光。根据杂散光系数和元件制冷温度的关系得出:当制冷温度为200K时,仿真系统的杂散光系数小于2%。分析结果对导弹的多目标复合半实物仿真系统的设计具有重要的指导意义。Stray light analysis is one of the key technologies for the optical system design. Based on the Monte-Carlo method,the analysis of stray light level for multi-target compounding hardware-in-loop(HWIL)system in software Tracepro was present.Simulation results showed that two critical parts of stray lights of HWIL system were derived:one part was the unused expanded beam,which hit on the boundary of main concave mirror;another part was self-thermal stray light,which was caused by self-thermal radiation of key elements when system was under room temperature.The dependence of stray light coefficient on the cooling temperature of key element was analyzed,and the stray light coefficient was less 2%for cooling temperature of 200K.The simulation results are beneficial to the design of multi-target compounding HWIL system for the missile.

关 键 词：光学系统设计 杂散光分析 半实物仿真 多目标复合 自身辐射 

分 类 号：O435[机械工程—光学工程] TH74[理学—光学]