多孔硅制备方法新进展及在微传感器中的应用  

New Development of the Preparation Methods of Porous Silicon and its Application in Micro-sensors

作　　者：田斌[1] 胡明[1] 马家志[1] 张之圣[1] 

机构地区：[1]天津大学电子信息工程学院,天津300072

出　　处：《压电与声光》2003年第6期521-524,共4页Piezoelectrics & Acoustooptics

基　　金：国家自然科学基金资助项目(60071027);天津市自然科学基金资助项目(02603811;983603711)

摘　　要：对近几年国内外出现的几种多孔硅制备方法和装置,特别是电化学方法如旋转电解槽法、电偶电流法和双电解槽法进行了详细的介绍,并对它们各自的优缺点进行比较和分析,认为电化学刻蚀技术因为其特殊的优势,将在以后的发展中得到更广泛的应用。多孔硅由于其独特的物理、化学和光学性能及技术优势,已经在微传感器领域得到广泛的应用。Serveral novel preparation methods of the porous silicon are presented,especially electrochemical methods include rotating electrochemical cell,internal current generation and double cells technology. The advantages and disadvantages of these technologies are presented in detail. It is thought that the electrochemical methods will be used abroad because of their special superiorities. Porous silicon and its preparation technology have been used broadly in the fields of micro-sensors because of its special performance in physics,chemistry and optics.

关 键 词：多孔硅 制备方法 电化学 微传感器 

分 类 号：TN402[电子电信—微电子学与固体电子学]