Gd_5Si_2Ge_2/Gd室温磁制冷复合材料激光熔覆成形工艺研究  

Study on the Laser Cladding Process of the Room-temperature Magnetic Refrigerating Materials Gd_5Si_2Ge_2/Gd

作　　者：付浩[1] 陈云贵[1] 唐永柏[1] 涂铭旌[1] 

机构地区：[1]四川大学,四川成都610065

出　　处：《稀有金属材料与工程》2003年第5期387-389,共3页Rare Metal Materials and Engineering

基　　金：四川省科技厅重点科技攻关项目(01GG009-01川科计[2001])

摘　　要：就Gd_5Si_2Ge_2化合物的激光熔覆成形工艺作了初步研究。实验表明:Gd_5Si_2Ge_2在Gd基体上可以实现良好的冶金结合。在最小厚度不小于1mm的基板上,控制激光参数可以使熔覆层的稀释度保持在10%左右。Some initial researches on the laser cladding process of Gd5Si2Ge2/Gd compounds were made in this paper. Experiment results indicate that good metallurgical bonding can be obtained between the Gd5Si2Ge2 alloy and Gd base; on the Gd base whose minimal thickness is not less than 1mm, the dilution of the cladding can be kept about 10%.

关 键 词：磁制冷材料 激光熔覆 金属间化合物 钆 复合材料 

分 类 号：TG174.4[金属学及工艺—金属表面处理]