釉砖表面TiO_2薄层材料制备工艺研究  

Research on Preparation of the thin Film Material of TiO_2 On Substrate of Ceramic

作　　者：张小良[1] 陈建华[2] 胡治流[2] 赵翠华[2] 单志强[2] 

机构地区：[1]上海应用技术学院环境能源系,上海200233 [2]广西大学资源与环境学院,南宁市530004

出　　处：《矿产保护与利用》2003年第6期41-45,共5页Conservation and Utilization of Mineral Resources

摘　　要：研究了溶胶-凝胶制备工艺各参数对釉砖表面TiO2薄层的光催化活性的影响,包括薄层厚度、热处理时间、热处理温度、潮解时间、潮解方式、升温速度等,并用光催化异丁基钠黄药废水的降解率来评价它的活性指标。A series of experiments were conducted and the results showed that the preparation technological parameters such as film thickness, thermal treatment time, thermal treatment temperature, deliquescence time, deliquescence way, rising speed of temperature had influence on the photocatalytic activity of the TiO2 film material prepared by the sol - gel methods were studied in this paper. Activity index was evaluated by the degradation rate of catalysis isobutyl sodium xanthate waste water.

关 键 词：釉砖表面TiO2薄层材料 溶胶-凝胶法 制备工艺 参数 光催化 黄药降解率 活性指标 

分 类 号：TQ134.11[化学工程—无机化工]