高铜含量中孔Cu-Si二元氧化物的合成和表征  

Synthesis and Characterization of Cu(Ⅱ)-contained MCM41 with High Content of Copper

作　　者：孔岩[1] 陈嘉伊[1] 郭宪吉[1] 马会宣[1] 侯文华[1] 颜其洁[1] 

机构地区：[1]南京大学化学化工学院介观材料科学实验室,南京210093

出　　处：《高等学校化学学报》2004年第2期320-324,共5页Chemical Journal of Chinese Universities

基　　金：国家自然科学基金 (批准号 :2 0 173 0 2 6);南京大学现代分析中心测试基金资助

摘　　要：采用 CTAB(十六烷基三甲基溴化铵 )为模板剂 ,Na2 Si O3· 1 0 H2 O为硅源 ,Cu( NH3) 4( NO3) 2 为铜源 ,在常温下成功地合成出含铜质量分数高达 2 6% ,具有中孔结构的硅基氧化铜复合材料 .较系统地研究了反应时间、温度、 p H值和铜掺入量等对产物性能的影响 .用 XRD,HRTEM,FTIR,BET,TG-DTA。A series of Cu-containing MCM41 with high contents of copper was synthesized at room temperature by using Na_2SiO_3 as Si sources and Cu(NH_3)_4(NO_3)_2 as Cu sources and cetyltrimethyl ammonium bromide(CTAB) as the template. The influence of reaction conditions such as time, temperature, pH value and copper contents upon the structure of the materials was systematically studied. The mesoporous material containing up to 26%(mass fraction) copper was successfully synthesized under the best reaction conditions(t=20 ℃; pH=9—10; t=72 h). The structure of the materials was characterized by XRD, HRTEM, BET, TG-DTA, FTIR, ICP and XPS. The obtained material has a high surface area of 525 m 2/g with a narrow pore distribution at 3.11 nm.

关 键 词：中孔结构 硅基氧化铜复合材料 合成 结构表征 反应条件 铜含量 中孔分子筛 

分 类 号：TB383[一般工业技术—材料科学与工程]