铀表面脉冲电镀纳米镍镀层的组织结构研究  

Microstructure of Nanocrystalline Nickel Deposit Pulse-plated on Uranium Surface

作　　者：王庆富[1] 张鹏程[1] 王晓红[1] 任大鹏[1] 郎定木[1] 张延志[1] 

机构地区：[1]中国工程物理研究院,四川绵阳621900

出　　处：《表面技术》2004年第1期18-20,共3页Surface Technology

摘　　要：　利用X射线衍射(XRD)、扫描电镜(SEM)、透射电镜(TEM)技术对铀表面脉冲电镀镍镀层的组织结构进行了研究。结果表明:该镀层晶体结构为面心立方;具有高(200)面择优取向,其相对取向密度为3.44;晶粒大小约45.5nm;镀层细致、具有多晶特性,存在位错、层错、孪晶等缺陷;利用脉冲电镀在铀表面制备纳米镍镀层是可行的。The microstructures of the nickel deposit ,which was prepared by pulse-plating technology on uranium surface, have been studied by X-ray diffractometry(XRD),scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The results indicate that the crystallographic structure of the deposit is face centered cubic; the deposit has a highly preferred orientation of (200), the relative orientation density of (200) is 3.44; the average grain size is about 45.5nm. The deposit is fine and has multi-grain property as well as some crystallographic defects such as dislocation, stacking and twin. It's feasible to prepare nanocrystalline nickel deposit on uranium surface by pulse plating technology.

关 键 词：铀 纳米镍镀层 脉冲电镀 组织结构 晶体结构 取向密度 晶粒 

分 类 号：TQ153.12[化学工程—电化学工业]