脉冲激光沉积羟基磷灰石薄膜的研究现状  

A review of hydroxyapatite films deposited by pulsed laser

作　　者：陈传忠[1] 姚书山[1] 包全合[1] 张亮[1] 雷廷权[1] 

机构地区：[1]山东大学材料科学与工程学院,济南250061

出　　处：《激光技术》2004年第1期74-77,共4页Laser Technology

基　　金：山东省优秀中青年科研奖励基金资助项目(0 2BS0 5 6 )

摘　　要：羟基磷灰石 (HA)具有优良的生物相容性 ,被用作植入体涂层材料广泛应用于整形外科、神经外科和牙科方面 ,利用脉冲激光沉积 (PLD)技术制备的HA薄膜具有高的结晶度和结合强度 ,受到人们的关注。综述了PLD技术制备HA薄膜的研究现状 ,系统地阐述了沉积过程中工艺参数对薄膜性质的影响 ,包括靶材的性质、气氛、衬底温度、激光波长和能量密度、缓冲膜等 ,分析了薄膜的力学特性和生物活性 。Hydroxyapatite (HA) have been used as coatings on implants for orthopedics,neurosurgery and dentistry owing to their biocompatible properties. Recently,pulsed laser deposition (PLD) was investigated to produce HA films of high crystallinity and bonding strength. The purpose of this paper is to summarize the present situation of HA films deposited by pulsed laser and systematically review the effect of various parameters of the PLD process on the properties of films,including target properties,ambient gas,substrate temperature,buffer layer,laser wavelength and energy density. Mechanical properties and bioactivity were analyzed,and the application foreground was also prospected.

关 键 词：脉冲激光沉积 羟基磷灰石 薄膜 影响因素 研究现状 

分 类 号：O484.1[理学—固体物理]