铋(Ⅲ)-8-羟基喹哪啶体系极谱行为和表面活性剂增敏机理  

The Polarographic Behaviour of Bismuth(III)-8-Hydroxyquinaldine System and the Enhancement Mechanism of Surfactant

作　　者：张月霞[1] 蒲宇宏 

机构地区：[1]冶金部钢铁研究总院 [2]北京科技大学

出　　处：《冶金分析》1992年第5期4-8,共5页Metallurgical Analysis

基　　金：国家自然科学基金资助课题

摘　　要：本文在研究了铋(Ⅲ)—8-羟基喹哪啶(8-OXQ)体系极谱行为的基础上,详细研究了阴离子表面活性剂十二烷基苯磺酸钠(SDBS)对该体系示波极谱电流(ip)增敏机理。建立了测定高温合金中痕量(10^(-5)—10^(-4)％)铋的高灵敏新方法,检出限为0.4ng/ml(1.9×10^(-9)mol/L),结果可靠、满意。文中对比了Bi(Ⅲ)和8-羟基喹啉(8-OX)及其衍生物体系结合物峰电流以及Bi(Ⅲ),Pb(Ⅱ)-8-OXQ体系和Cu(Ⅱ),Cd(Ⅱ),Zn(Ⅱ)—乙二胺体系被SDBS增敏效应,然后提出有关体系被SDBS增敏的机理和规律。On the basis of the study on the polarographic behaviour of Bi(Ⅲ)-8-hydroxyquinaldine, the enhancement mechanism of oscillopolarograhic current(ip) of that system by aniou surfactant,sodium dodecyl benzene sulfonate(SDBS) has been investigated in detail. A new high-sensitive method for determination of trace bismuth(10-5%-10-4%)in superalloy was established. The detection limit of Bi(Ⅲ) was 0.4 ng/ml( 1.9×10-9mol/L ). The results were reliable and satisfactory. The enhancement effect of SDBS on the peak current of complex Bi(Ⅲ) with 8-oxine and its derivatives and also the enhancement of the systems of Bi(Ⅱ), Pb(Ⅱ)-8-OXQ, Cu(Ⅱ), Cd(Ⅱ), Zn(Ⅱ)-ethylendiamine( En ) by SDBS were contrasted, then the enhancement mechanism and the regularity of corresponding systems by SDBS was suggested.

关 键 词：表面活性剂 示波极谱法 铋离子 

分 类 号：O614.532[理学—无机化学]