高强度激光三倍频增透膜的制备  

Preparation of Laser Frequency Tripling Antireflective Film with High-strength

作　　者：付甜[1] 吴广明[1] 沈军[1] 张志华[1] 

机构地区：[1]同济大学波耳固体物理研究所,上海200092

出　　处：《同济大学学报（自然科学版）》2004年第2期277-280,共4页Journal of Tongji University:Natural Science

基　　金：国家自然科学基金重大资助项目(20133040;69978017);国家'八六三'高技术研究发展计划资助项目(2002AA842052);上海市重点学科建设资助项目;上海市科技发展基金资助项目(02SL001)

摘　　要：激光技术的发展对增透膜的要求越来越高.采用溶胶-凝胶工艺,运用提拉法镀膜技术与氨处理的后处理工艺,制备了高强度的纳米多孔SiO2增透膜.利用分光光度计研究了提拉速度对透射光谱的影响.结果表明,可以通过控制提拉速度来控制薄透射峰值的位置.经过氨处理,薄膜的机械强度比未采用氨处理的薄膜大大增强,并利用红外光谱、原子力显微镜(AFM)等分析手段分析了薄膜强度增强的机理.最后在石英玻璃基底上镀制了激光三倍频增透膜,该薄膜在355nm处透射率为99.58％,满足了实际应用的需要.Nano-porous SiO2 antireflective film with high-strength was made using dipping-coating technique with ammonia process post treatment by Sol-Gel method. The effect of different dip speed on transmission spectra is studied. The result shows that the site of transmission peak shifts with various dip speed. After ammonia process treatment, the mechanical property of film was improved obviously and the mechanism was discussed by IR spectrum,AFM analysis methods. Laser frequency tripling antireflective film was made on silex glass substrate. The reflectance of film at 355 run is about 99.58% .

关 键 词：溶胶-凝胶技术 激光三倍频 增透膜 高强度 

分 类 号：O484.41[理学—固体物理]